Noor, F., 		Masturi, M., 		Abdullah, M., & 		Khairurrijal, K.
(2014).
 Effect of Thickness and Temperature of SiO2 Layer on Leakage Currents in MOS Capacitor Materials with High Dielectric Constant by Involving the Charge Trap.
<em>Jurnal ILMU DASAR, 15</em>(1), 1-5.
doi:10.19184/jid.v15i1.642